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dc.creatorVergara Platero, Josées_ES
dc.creatorFavieres Ruiz, Cristinaes_ES
dc.creatorMadurga Pérez, Vicentees_ES
dc.date.accessioned2014-06-13T11:37:49Z
dc.date.available2014-06-13T11:37:49Z
dc.date.issued2012
dc.identifier.issn1931-7573
dc.identifier.other509
dc.identifier.urihttps://hdl.handle.net/2454/10872
dc.descriptionUPNa. Departamento de Física. Laboratorio de Magnetismoes_ES
dc.description.abstractIn this study, the fabrication of magnetic multilayers with a controlled value of the in-plane uniaxial magnetic anisotropy field in the range of 12 to 72 kA/m was achieved. This fabrication was accomplished by the deposition of bilayers consisting of an obliquely deposited (54A degrees) 8-nm-thick anisotropic Co layer and a second isotropic Co layer that was deposited at a normal incidence over the first layer. By changing the thickness value of this second Co layer (X) by modifying the deposition time, the value of the anisotropy field of the sample could be controlled. For each sample, the thickness of each bilayer did not exceed the value of the exchange correlation length calculated for these Co bilayers. To increase the volume of the magnetic films without further modification of their magnetic properties, a Ta spacer layer was deposited between successive Co bilayers at 54A degrees to prevent direct exchange coupling between consecutive Co bilayers. This step was accomplished through the deposition of multilayered films consisting of several (Co8 nm-54A degrees/Co (X nm-0A degrees)/Ta6 nm-54A degrees) trilayers.en
dc.description.sponsorshipThis work was partially supported by the Spanish government under project MAT2007-66252.en
dc.format.mimetypeapplication/pdfen
dc.language.isoengen
dc.publisherSpringeren
dc.relation.ispartofNanoscale Research Letters, 2012, 7: 577en
dc.rights© 2012 Vergara et al.; licensee Springer. This is an Open Access article distributed under the terms of the Creative Commons Attribution License (http://creativecommons.org/licenses/by/2.0), which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly citeden
dc.rights.urihttp://creativecommons.org/licenses/by/2.0
dc.subjectMagnetic multilayersen
dc.subjectExchange couplingen
dc.subjectMagnetic anisotropyen
dc.subjectThin filmsen
dc.subjectOblique incidenceen
dc.subjectMultilayer filmsen
dc.subjectPermalloy filmsen
dc.subjectEnergyen
dc.subjectProducten
dc.subjectIron filmsen
dc.subjectDepositionen
dc.subjectSurfaceen
dc.subjectOriginen
dc.subjectGrowthen
dc.titleMagnetic anisotropy in isotropic and nanopatterned strongly exchange-coupled nanolayersen
dc.typeArtículo / Artikuluaes
dc.typeinfo:eu-repo/semantics/articleen
dc.contributor.affiliationNafarroako Unibertsitate Publikoa. Fisika Sailaeu
dc.contributor.affiliationUniversidad Pública de Navarra. Departamento de Físicaes_ES
dc.rights.accessRightsAcceso abierto / Sarbide irekiaes
dc.rights.accessRightsinfo:eu-repo/semantics/openAccessen
dc.identifier.doi10.1186/1556-276X-7-577
dc.relation.projectIDinfo:eu-repo/grantAgreement/ES/5PN/MAT2007-66252
dc.relation.publisherversionhttps://dx.doi.org/10.1186/1556-276X-7-577
dc.type.versionVersión publicada / Argitaratu den bertsioaes
dc.type.versioninfo:eu-repo/semantics/publishedVersionen


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© 2012 Vergara et al.; licensee Springer. This is an Open Access article distributed under the terms of the Creative Commons Attribution License (http://creativecommons.org/licenses/by/2.0), which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited
La licencia del ítem se describe como © 2012 Vergara et al.; licensee Springer. This is an Open Access article distributed under the terms of the Creative Commons Attribution License (http://creativecommons.org/licenses/by/2.0), which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited