Simple fabrication of ultrahigh aspect ratio nanostructures for enhanced antireflectivity
Fecha
2014Autor
Versión
Acceso abierto / Sarbide irekia
Tipo
Artículo / Artikulua
Versión
Versión publicada / Argitaratu den bertsioa
Impacto
|
10.1116/1.4869302
Resumen
In this work, the authors present a novel fabrication process to create periodic nanostructures with aspect ratio as high as 9.6. These nanostructures reduce spectral reflectance of silicon to less than 4% over the broad wavelength region from 200 to 2000nm. At the visible range of the spectrum, from 200 to 650 nm, reflectivity is reduced to less than 0.1%. The aspect ratio and reflectance perfor ...
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In this work, the authors present a novel fabrication process to create periodic nanostructures with aspect ratio as high as 9.6. These nanostructures reduce spectral reflectance of silicon to less than 4% over the broad wavelength region from 200 to 2000nm. At the visible range of the spectrum, from 200 to 650 nm, reflectivity is reduced to less than 0.1%. The aspect ratio and reflectance performance that the authors achieved have never been reported before for ordered tapered nanostructures, to our knowledge. [--]
Materias
Nanostructures,
Antireflectivity,
Silicon
Editor
American Vacuum Society
Publicado en
Journal of Vacuum Science and Technology B, 32 (3), May/June 2014
Departamento
Universidad Pública de Navarra. Departamento de Física /
Nafarroako Unibertsitate Publikoa. Fisika Saila
Versión del editor
Entidades Financiadoras
This work was supported in part by Department of Innovation, Enterprise and Employment of Gobierno de Navarra research grant 1858/2012 [...]