Generation of surface plasmon resonance and lossy mode resonance by thermal treatment of ITO thin-films
Fecha
2014Autor
Versión
Acceso abierto / Sarbide irekia
Tipo
Artículo / Artikulua
Versión
Versión aceptada / Onetsi den bertsioa
Impacto
|
10.1016/j.optlastec.2014.12.012
Resumen
Silicon wafers coated with IndiumTinOxide (ITO) by application of sputtering technique have been
characterized after different post-annealing techniques, showing that this last factor is critical for the
quality of the thin-film and for the creation and tuning of both surface plasmon resonances and lossy
mode resonances. By adequate selection of the ITO thin-film thickness both resonances can ...
[++]
Silicon wafers coated with IndiumTinOxide (ITO) by application of sputtering technique have been
characterized after different post-annealing techniques, showing that this last factor is critical for the
quality of the thin-film and for the creation and tuning of both surface plasmon resonances and lossy
mode resonances. By adequate selection of the ITO thin-film thickness both resonances can be tracked in
the same spectrum, which can be used in sensor and optical communications fields. [--]
Materias
Thin films,
Optical resonance,
Sensors
Editor
Elsevier
Publicado en
Optics & Laser Technology, vol. 69, june 2015, pgs. 1-7
Departamento
Universidad Pública de Navarra. Departamento de Ingeniería Eléctrica y Electrónica /
Nafarroako Unibertsitate Publikoa. Ingeniaritza Elektrikoa eta Elektronikoa Saila
Versión del editor
Entidades Financiadoras
This work was supported in part by the Spanish Ministry of
Education and Science-FEDER TEC2013-43679-R.