Domínguez Fernández, SagrarioCornago Santos, IgnacioBravo Larrea, JavierPérez Conde, JesúsChoi, Hyungryul J.Kim, Jeong-GilBarbastathis, George2016-06-162016-06-1620141071-102310.1116/1.4869302https://academica-e.unavarra.es/handle/2454/20888In this work, the authors present a novel fabrication process to create periodic nanostructures with aspect ratio as high as 9.6. These nanostructures reduce spectral reflectance of silicon to less than 4% over the broad wavelength region from 200 to 2000nm. At the visible range of the spectrum, from 200 to 650 nm, reflectivity is reduced to less than 0.1%. The aspect ratio and reflectance performance that the authors achieved have never been reported before for ordered tapered nanostructures, to our knowledge.application/pdfeng© 2014 American Vacuum SocietyNanostructuresAntireflectivitySiliconinfo:eu-repo/semantics/articleinfo:eu-repo/semantics/openAccess