Simple fabrication of ultrahigh aspect ratio nanostructures for enhanced antireflectivity

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Date
2014Author
Version
Acceso abierto / Sarbide irekia
Type
Artículo / Artikulua
Version
Versión publicada / Argitaratu den bertsioa
Impact
|
10.1116/1.4869302
Abstract
In this work, the authors present a novel fabrication process to create periodic nanostructures with aspect ratio as high as 9.6. These nanostructures reduce spectral reflectance of silicon to less than 4% over the broad wavelength region from 200 to 2000nm. At the visible range of the spectrum, from 200 to 650 nm, reflectivity is reduced to less than 0.1%. The aspect ratio and reflectance perfor ...
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In this work, the authors present a novel fabrication process to create periodic nanostructures with aspect ratio as high as 9.6. These nanostructures reduce spectral reflectance of silicon to less than 4% over the broad wavelength region from 200 to 2000nm. At the visible range of the spectrum, from 200 to 650 nm, reflectivity is reduced to less than 0.1%. The aspect ratio and reflectance performance that the authors achieved have never been reported before for ordered tapered nanostructures, to our knowledge. [--]
Subject
Nanostructures,
Antireflectivity,
Silicon
Publisher
American Vacuum Society
Published in
Journal of Vacuum Science and Technology B, 32 (3), May/June 2014
Departament
Universidad Pública de Navarra. Departamento de Física /
Nafarroako Unibertsitate Publikoa. Fisika Saila
Publisher version
Sponsorship
This work was supported in part by Department of Innovation, Enterprise and Employment of Gobierno de Navarra research grant 1858/2012 [...]