Mostrar el registro sencillo del ítem

Monitoring the etching process in LPFGs towards development of highly sensitive sensors

dc.creatorDel Villar, Ignacioes_ES
dc.creatorCruz, José Luises_ES
dc.creatorSocorro Leránoz, Abián Bentores_ES
dc.creatorDíaz Lucas, Silviaes_ES
dc.creatorCorres Sanz, Jesús Maríaes_ES
dc.creatorArregui San Martín, Francisco Javieres_ES
dc.creatorMatías Maestro, Ignacioes_ES
dc.date.accessioned2017-11-15T08:00:40Z
dc.date.available2017-11-15T08:00:40Z
dc.date.issued2017
dc.identifier.issn2504-3900
dc.identifier.urihttps://hdl.handle.net/2454/26129
dc.descriptionTrabajo presentado en la Eurosensors 2017 Conference. París, 3–6 de septiembre de 2017.es_ES
dc.description.abstractIn this work, the monitoring of the etching process up to a diameter of 30 µm of two LPFG structures has been compared, one of them had initially 125 µm, whereas the second one had 80 µm. By tracking the wavelength shift of the resonance bands during the etching process it is possible to check the quality of etching process (the 80 µm fibre performs better than de 125 µm fibre), and to stop for a specific cladding mode coupling, which permits to obtain an improved sensitivity compared to the initial structure.en
dc.description.sponsorshipThis work was supported by the Spanish Agencia Estatal de Investigación (AEI) and Fondo Europeo de Desarrollo Regional (FEDER) TEC2016-78047-R and by the Government of Navarre through its projects with references: 2016/PI008, 2016/PC025 and 2016/PC026.en
dc.format.extent4 p.
dc.format.mimetypeapplication/pdfen
dc.language.isoengen
dc.publisherMDPIen
dc.relation.ispartofProceedings, 1(4), 331en
dc.rights© 2017 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license.en
dc.rights.urihttp://creativecommons.org/licenses/by/4.0/
dc.subjectEtchingen
dc.subjectLong period fiber gratingen
dc.subjectOptic fibre sensoren
dc.subjectRefractive indexen
dc.titleMonitoring the etching process in LPFGs towards development of highly sensitive sensorsen
dc.typeContribución a congreso / Biltzarrerako ekarpenaes
dc.typeinfo:eu-repo/semantics/conferenceObjecten
dc.contributor.departmentIngeniería Eléctrica y Electrónicaes_ES
dc.contributor.departmentIngeniaritza Elektrikoa eta Elektronikoaeu
dc.contributor.departmentInstitute for Advanced Materials - INAMATes_ES
dc.rights.accessRightsAcceso abierto / Sarbide irekiaes
dc.rights.accessRightsinfo:eu-repo/semantics/openAccessen
dc.identifier.doi10.3390/proceedings1040331
dc.relation.projectIDinfo:eu-repo/grantAgreement/ES/1PE/TEC2016-78047-Ren
dc.relation.publisherversionhttps://dx.doi.org/10.3390/proceedings1040331
dc.type.versionVersión publicada / Argitaratu den bertsioaes
dc.type.versioninfo:eu-repo/semantics/publishedVersionen
dc.contributor.funderGobierno de Navarra / Nafarroako Gobernua: 2016/PI008
dc.contributor.funderGobierno de Navarra / Nafarroako Gobernua: 2016/PC025
dc.contributor.funderGobierno de Navarra / Nafarroako Gobernua: 2016/PC026


Ficheros en el ítem

Thumbnail
Nombre:
02_MonitoringEtching.pdf
Tamaño:
820.7Kb
Formato:
PDF
Ver/

Este ítem aparece en la(s) siguiente(s) colección(ones)

Mostrar el registro sencillo del ítem

© 2017 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license.
La licencia del ítem se describe como © 2017 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license.
El Repositorio ha recibido la ayuda de la Fundación Española para la Ciencia y la Tecnología para la realización de actividades en el ámbito del fomento de la investigación científica de excelencia, en la Línea 2. Repositorios institucionales (convocatoria 2020-2021).
Logo MinisterioLogo Fecyt

Contacto | Sugerencias