Multiple absorption regimes in simple lithography-free structures leading to ultrathin slabs

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dc.contributor.authorLezaun Capdevila, Carlos
dc.contributor.authorNavajas Hernández, David
dc.contributor.authorLiberal Olleta, Íñigo
dc.contributor.authorBeruete Díaz, Miguel
dc.contributor.departmentIngeniería Eléctrica, Electrónica y de Comunicaciónes_ES
dc.contributor.departmentIngeniaritza Elektrikoa, Elektronikoa eta Telekomunikazio Ingeniaritzaeu
dc.contributor.departmentInstitute of Smart Cities - ISCen
dc.contributor.funderUniversidad Pública de Navarra / Nafarroako Unibertsitate Publikoa
dc.date.accessioned2024-11-19T10:06:36Z
dc.date.available2024-11-19T10:06:36Z
dc.date.issued2024-07-08
dc.date.updated2024-11-19T09:53:15Z
dc.description.abstractElectromagnetic absorbers serve as fundamental components for a wide range of applications, encompassing energy and heat management, sensing, and communications. In this study, we explore several complex permittivity combinations for lithography-free material-reflector and material-spacer-reflector configurations that lead to perfect absorption peaks across distinct permittivity regimes and varying thicknesses. We provide an extensive analysis of angle and polarization dependencies, specifically using silicon carbide as an illustrative example. Our findings reveal the potential for harnessing different absorption regimes within a single device, thus enabling the realization of multiband absorption capabilities. Furthermore, we demonstrate perfect absorption linked with extreme values of permittivity, and we find the conditions to get perfect absorption in ultrathin slabs. In addition, we carry out an analysis about the response at oblique incidence, and we identify a particular mode in the negative permittivity region and its hybridization with epsilon-near-zero modes at oblique incidence. This investigation serves as a valuable standardization of absorber design, offering insights to develop perfect absorbers for infrared applications such as thermal emission, communications, and sensing.en
dc.description.sponsorshipThe research presented in this paper has been supported by funding from the European Union's Horizon 2020 research and innovation program under Grant Agreement No. 964450 (MIRACLE project, more information available in Ref. ) from the EU Commission. Additionally, this work has received financial support from Project No. TED2021-132074B-C33, funded by MCIN/AEI/10.13039/501100011033, and the European Union NextGenerationEU/PRTR and from Project No. PID2022-137845NB-C21, funded by MCIN/AEI/10.13039/501100011033 and by FEDER Una manera de hacer Europa. C.L. acknowledges financial support from Santander Bank and Public University of Navarra under resolution 2659/2021.
dc.format.mimetypeapplication/pdfen
dc.identifier.citationLezaun, C., Navajas, D., Liberal, I., Beruete, M. (2024). Multiple absorption regimes in simple lithography-free structures leading to ultrathin slabs. Physical Review B, 110(4), 1-12. https://doi.org/10.1103/PhysRevB.110.045408.
dc.identifier.doi10.1103/PhysRevB.110.045408
dc.identifier.issn2469-9950
dc.identifier.urihttps://academica-e.unavarra.es/handle/2454/52534
dc.language.isoeng
dc.relation.ispartofPhysical Review B (2024), vol. 110, núm. 4, 045408
dc.relation.projectIDinfo:eu-repo/grantAgreement/European Commission/Horizon 2020 Framework Programme/964450/
dc.relation.projectIDinfo:eu-repo/grantAgreement/AEI//TED2021-132074B-C33/
dc.relation.projectIDinfo:eu-repo/grantAgreement/AEI/Plan Estatal de Investigación Científica y Técnica y de Innovación 2021-2023/PID2022-137845NB-C21/ES/
dc.relation.publisherversionhttps://doi.org/10.1103/PhysRevB.110.045408
dc.rights©2024 American Physical Society
dc.rights.accessRightsinfo:eu-repo/semantics/openAccess
dc.subjectInfrared absorption and emissionen
dc.subjectEpsilon-Near-Zero (ENZ) Mediaen
dc.subjectMonolayer and bilayer absorbersen
dc.subjectThermal management technologiesen
dc.titleMultiple absorption regimes in simple lithography-free structures leading to ultrathin slabsen
dc.typeinfo:eu-repo/semantics/article
dc.type.versioninfo:eu-repo/semantics/acceptedVersion
dspace.entity.typePublication
relation.isAuthorOfPublicationca4aa184-deea-4491-89b0-13970303e648
relation.isAuthorOfPublication5eab4a17-b7d4-43c9-b388-4cd49b64f0d1
relation.isAuthorOfPublication781ff0dc-60db-4bd0-bef0-49e27c76b542
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relation.isAuthorOfPublication.latestForDiscoveryca4aa184-deea-4491-89b0-13970303e648

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