Simple fabrication of ultrahigh aspect ratio nanostructures for enhanced antireflectivity
dc.contributor.author | Domínguez Fernández, Sagrario | |
dc.contributor.author | Cornago Santos, Ignacio | |
dc.contributor.author | Bravo Larrea, Javier | |
dc.contributor.author | Pérez Conde, Jesús | |
dc.contributor.author | Choi, Hyungryul J. | |
dc.contributor.author | Kim, Jeong-Gil | |
dc.contributor.author | Barbastathis, George | |
dc.contributor.department | Física | es_ES |
dc.contributor.department | Fisika | eu |
dc.contributor.funder | Gobierno de Navarra / Nafarroako Gobernua: 1858/2012 | es |
dc.date.accessioned | 2016-06-16T07:08:02Z | |
dc.date.available | 2016-06-16T07:08:02Z | |
dc.date.issued | 2014 | |
dc.description.abstract | In this work, the authors present a novel fabrication process to create periodic nanostructures with aspect ratio as high as 9.6. These nanostructures reduce spectral reflectance of silicon to less than 4% over the broad wavelength region from 200 to 2000nm. At the visible range of the spectrum, from 200 to 650 nm, reflectivity is reduced to less than 0.1%. The aspect ratio and reflectance performance that the authors achieved have never been reported before for ordered tapered nanostructures, to our knowledge. | en |
dc.description.sponsorship | This work was supported in part by Department of Innovation, Enterprise and Employment of Gobierno de Navarra research grant 1858/2012 [...] | en |
dc.format.mimetype | application/pdf | en |
dc.identifier.doi | 10.1116/1.4869302 | |
dc.identifier.issn | 1071-1023 | |
dc.identifier.uri | https://academica-e.unavarra.es/handle/2454/20888 | |
dc.language.iso | eng | en |
dc.publisher | American Vacuum Society | en |
dc.relation.ispartof | Journal of Vacuum Science and Technology B, 32 (3), May/June 2014 | en |
dc.relation.publisherversion | https://doi.org/10.1116/1.4869302 | |
dc.rights | © 2014 American Vacuum Society | en |
dc.rights.accessRights | info:eu-repo/semantics/openAccess | |
dc.subject | Nanostructures | en |
dc.subject | Antireflectivity | en |
dc.subject | Silicon | en |
dc.title | Simple fabrication of ultrahigh aspect ratio nanostructures for enhanced antireflectivity | en |
dc.type | info:eu-repo/semantics/article | |
dc.type.version | info:eu-repo/semantics/publishedVersion | |
dspace.entity.type | Publication | |
relation.isAuthorOfPublication | 875f523e-0fda-402d-9e44-b7a2229e99f3 | |
relation.isAuthorOfPublication | b2c91e11-1e3a-4e0e-9ab7-aee10d8d9cb5 | |
relation.isAuthorOfPublication.latestForDiscovery | 875f523e-0fda-402d-9e44-b7a2229e99f3 |