Lithography-free perfect narrowband absorbers using simple layered structures

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dc.contributor.authorLezaun Capdevila, Carlos
dc.contributor.authorNavajas Hernández, David
dc.contributor.authorLiberal Olleta, Íñigo
dc.contributor.authorBeruete Díaz, Miguel
dc.contributor.departmentIngeniería Eléctrica, Electrónica y de Comunicaciónes_ES
dc.contributor.departmentIngeniaritza Elektrikoa, Elektronikoa eta Telekomunikazio Ingeniaritzaeu
dc.contributor.departmentInstitute of Smart Cities - ISCen
dc.date.accessioned2025-04-16T08:46:44Z
dc.date.available2025-04-16T08:46:44Z
dc.date.issued2024-10-08
dc.date.updated2025-04-16T08:41:41Z
dc.description.abstractLight absorbers are key components for multiple applications ranging from heat and energy management to communications and sensing. This work explores different complex permittivity combinations for material-reflector and material-spacer-reflector configurations, achieving perfect absorption under different permittivity regimes and thicknesses. Using silicon carbide, we discuss polarization and angle dependencies, and the potential of exploiting different permittivity regimes within a device for multi-band absorption. This work helps standardize absorber design and offer insights to engineer perfect absorbers for applications such as thermal emission, absorption, communication and sensing.en
dc.description.sponsorshipThe project has received funding from the European Union's Horizon 2020 research and innovation program under grant agreement 964450, MIRACLE and from project TED2021-132074B-C33, funded by MCIN/AEI/10.13039/501100011033 and by European Union NextGenerationEU/PRTR\.
dc.format.mimetypeapplication/pdfen
dc.identifier.citationLezaun, C., Navajas, D., Liberal, I., Beruete, M. (2024). Lithography-free perfect narrowband absorbers using simple layered structures. In [IEEE], 2024 18th International Congress on Artificial Materials for Novel Wave Phenomena (Metamaterials) (pp. 1-3). Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/Metamaterials62190.2024.10703325.
dc.identifier.doi10.1109/Metamaterials62190.2024.10703325
dc.identifier.isbn979-8-3503-7350-9
dc.identifier.urihttps://academica-e.unavarra.es/handle/2454/54005
dc.language.isoeng
dc.publisherIEEE
dc.relation.projectIDinfo:eu-repo/grantAgreement/European Commission/Horizon 2020 Framework Programme/964450/
dc.relation.projectIDinfo:eu-repo/grantAgreement/AEI/Plan Estatal de Investigación Científica y Técnica y de Innovación 2021-2023/TED2021-132074B-C33/
dc.relation.publisherversionhttps://doi.org/10.1109/Metamaterials62190.2024.10703325
dc.rights© 2024 IEEE. Personal use of this material is permitted. Permission from IEEE must be obtained for all other uses, in any current or future media, including reprinting/republishing this material for advertising or promotional purposes, creating new collective works, for resale or redistribution to servers or lists, or reuse of any copyrighted component of this work in other work.
dc.rights.accessRightsinfo:eu-repo/semantics/openAccess
dc.subjectPerfect absorptionen
dc.subjectSilicon carbideen
dc.subjectDielectric functionen
dc.subjectThermal emissionen
dc.subjectPeriodic structureen
dc.subjectThermal managementen
dc.subjectTransmission line theoryen
dc.subjectAbsorption phenomenonen
dc.subjectDielectric spaceren
dc.titleLithography-free perfect narrowband absorbers using simple layered structuresen
dc.typeinfo:eu-repo/semantics/conferenceObject
dc.type.versioninfo:eu-repo/semantics/acceptedVersion
dspace.entity.typePublication
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