Lithography-free perfect narrowband absorbers using simple layered structures

Date

2024-10-08

Director

Publisher

IEEE
Acceso abierto / Sarbide irekia
Contribución a congreso / Biltzarrerako ekarpena
Versión aceptada / Onetsi den bertsioa

Project identifier

  • European Commission/Horizon 2020 Framework Programme/964450/ openaire
  • AEI/Plan Estatal de Investigación Científica y Técnica y de Innovación 2021-2023/TED2021-132074B-C33/
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Abstract

Light absorbers are key components for multiple applications ranging from heat and energy management to communications and sensing. This work explores different complex permittivity combinations for material-reflector and material-spacer-reflector configurations, achieving perfect absorption under different permittivity regimes and thicknesses. Using silicon carbide, we discuss polarization and angle dependencies, and the potential of exploiting different permittivity regimes within a device for multi-band absorption. This work helps standardize absorber design and offer insights to engineer perfect absorbers for applications such as thermal emission, absorption, communication and sensing.

Description

Keywords

Perfect absorption, Silicon carbide, Dielectric function, Thermal emission, Periodic structure, Thermal management, Transmission line theory, Absorption phenomenon, Dielectric spacer

Department

Ingeniería Eléctrica, Electrónica y de Comunicación / Ingeniaritza Elektrikoa, Elektronikoa eta Telekomunikazio Ingeniaritza / Institute of Smart Cities - ISC

Faculty/School

Degree

Doctorate program

item.page.cita

Lezaun, C., Navajas, D., Liberal, I., Beruete, M. (2024). Lithography-free perfect narrowband absorbers using simple layered structures. In [IEEE], 2024 18th International Congress on Artificial Materials for Novel Wave Phenomena (Metamaterials) (pp. 1-3). Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/Metamaterials62190.2024.10703325.

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