Publication: Monitoring the etching process in LPFGs towards development of highly sensitive sensors
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In this work, the monitoring of the etching process up to a diameter of 30 µm of two LPFG structures has been compared, one of them had initially 125 µm, whereas the second one had 80 µm. By tracking the wavelength shift of the resonance bands during the etching process it is possible to check the quality of etching process (the 80 µm fibre performs better than de 125 µm fibre), and to stop for a specific cladding mode coupling, which permits to obtain an improved sensitivity compared to the initial structure.
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